Invention Application
- Patent Title: PROCESS FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING DEVICE
- Patent Title (中): 制造半导体发光装置的方法
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Application No.: US11558115Application Date: 2006-11-09
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Publication No.: US20070077674A1Publication Date: 2007-04-05
- Inventor: Hiroyuki Okuyama , Masato Doi , Goshi Biwa , Toyoharu Oohata , Tomoyuki Kikutani
- Applicant: Hiroyuki Okuyama , Masato Doi , Goshi Biwa , Toyoharu Oohata , Tomoyuki Kikutani
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Priority: JPP2000-218034 20000718; JPP2000-217663 20000718; JPP2000-217508 20000718; JPP2000-217799 20000718; JPP2000-218101 20000718; JPP2001-200183 20010629
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A process for producing a semiconductor light-emitting device is provided. The process includes providing a substrate including a substrate surface oriented along a substrate surface plane, forming a crystal seed layer on the substrate surface, forming a masking layer on the crystal seed layer, wherein the masking layer includes an opening, forming a crystal layer by selective growth of the crystal seed layer through the opening of the masking layer, wherein the crystal layer includes a crystal layer surface oriented along a crystal layer plane that diagonally intersects the substrate surface, and forming each of a first conductive layer, an active layer, and a second conductive layer along at least a portion of the crystal layer surface.
Information query
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