发明申请
- 专利标题： Gas dispersion plate and manufacturing method therefor
- 专利标题（中）： 气体分散板及其制造方法
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申请号： US11512431申请日： 2006-08-30
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公开(公告)号： US20070079934A1公开(公告)日： 2007-04-12
- 发明人: Yukitaka Murata , Sachiyuki Nagasaka , Keiji Morita , Keisuke Watanabe , Shigenori Wakabayashi
- 申请人： Yukitaka Murata , Sachiyuki Nagasaka , Keiji Morita , Keisuke Watanabe , Shigenori Wakabayashi
- 专利权人： TOSHIBA CERAMICS CO., LTD.
- 当前专利权人： TOSHIBA CERAMICS CO., LTD.
- 优先权： JPP.2005-252797 20050831; JPP.2005-262627 20050909
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; C23F1/00 ; C23C16/00
摘要：
To provide an inexpensive gas dispersion plate having a high corrosion resistance to halogen-based corrosive gasses and a plasma thereof, and capable of preventing particle generation from the gas hole, thereby contributing to an improvement in the production yield of the semiconductor devices. The gas dispersion plate includes one or plural gas holes in a base material formed by a Y2O3 ceramic material having a relative density of 96% or more, in which an edge part of the gas hole is formed by a sand blasting process into a rounded shape with a radius of curvature of 0.2 mm or more.
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