Invention Application
- Patent Title: Coating compositions for use with an overcoated photoresist
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Application No.: US11633987Application Date: 2006-12-05
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Publication No.: US20070092746A1Publication Date: 2007-04-26
- Inventor: Gerald Wayton , Peter Trefonas , Suzzanne Coley , Tomoki Kurihara
- Applicant: Gerald Wayton , Peter Trefonas , Suzzanne Coley , Tomoki Kurihara
- Applicant Address: US MA Marlborough 01752
- Assignee: Shipley Company, L.L.C.
- Current Assignee: Shipley Company, L.L.C.
- Current Assignee Address: US MA Marlborough 01752
- Main IPC: B32B27/36
- IPC: B32B27/36 ; C08K5/42
Abstract:
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
Public/Granted literature
- US07582360B2 Coating compositions for use with an overcoated photoresist Public/Granted day:2009-09-01
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