公开(公告)号：US20060068335A1

公开(公告)日：2006-03-30

申请号：US11131890

申请日：2005-05-18

Applicant: Suzanne Coley ,  Peter Trefonas ,  Patricia Fallon ,  Gerald Wayton

Inventor： Suzanne Coley ,  Peter Trefonas ,  Patricia Fallon ,  Gerald Wayton

IPC: G03F7/00 ,  G03F7/004

CPC classification number: G03F7/091 ,  G03F7/0382 ,  G03F7/0392

Abstract: Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.

Abstract translation: 提供的组合物和方法可以减少从衬底暴露辐射回到外涂光致抗蚀剂层的反射和/或作为平坦化或通孔填充层的功能。 本发明优选的涂料组合物和方法可以提供图案化涂覆的光致抗蚀剂层的增强的分辨率，并且包括使用低活化温度的热酸发生剂以及多个热处理以处理下层涂料组合物的层。

公开(公告)号：US20070092746A1

公开(公告)日：2007-04-26

申请号：US11633987

申请日：2006-12-05

Applicant: Gerald Wayton ,  Peter Trefonas ,  Suzzanne Coley ,  Tomoki Kurihara

Inventor： Gerald Wayton ,  Peter Trefonas ,  Suzzanne Coley ,  Tomoki Kurihara

IPC: B32B27/36 ,  C08K5/42

CPC classification number: C09D167/00 ,  G03F7/091 ,  Y10T428/31786

Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

公开(公告)号：US20070042289A1

公开(公告)日：2007-02-22

申请号：US11481209

申请日：2006-07-05

Applicant: James Thackeray ,  Gerald Wayton ,  Charles Szmanda

Inventor： James Thackeray ,  Gerald Wayton ,  Charles Szmanda

IPC: G03C1/00

CPC classification number: G03F7/11 ,  G03F7/0392 ,  G03F7/091

Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.

Abstract translation: 提供底涂层组合物用于外涂光致抗蚀剂组合物。 在一个方面，涂料组合物可以是交联的并且包含一种或多种含有一个或多个酸不稳定基团的组分和/或一个或多个在交联后是反应性的碱反应性基团。 在另一方面，提供了可以处理以提供调制水接触角的下面的涂料组合物。 优选的涂料组合物可以增强相关光致抗蚀剂组合物的平版印刷性能。

公开(公告)号：US20060105272A1

公开(公告)日：2006-05-18

申请号：US11173932

申请日：2005-07-01

Applicant: Michael Gallagher ,  Gerald Wayton ,  Gregory Prokopowicz ,  Stewart Robertson

Inventor： Michael Gallagher ,  Gerald Wayton ,  Gregory Prokopowicz ,  Stewart Robertson

IPC: G03C5/00

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/11

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract translation: 本发明涉及用于浸没式光刻处理的光致抗蚀剂组合物上的阻挡层组合物。 在另一方面，提供了用于浸没式光刻处理的新方法。

公开(公告)号：US20070264580A1

公开(公告)日：2007-11-15

申请号：US11712160

申请日：2007-02-28

Applicant: Anthony Zampini ,  Gerald Wayton

Inventor： Anthony Zampini ,  Gerald Wayton

IPC: G03F5/00

CPC classification number: G03F7/091 ,  C08L33/066 ,  C08L35/00 ,  C08L67/00 ,  C08L2312/00 ,  C09D133/064 ,  C09D133/066 ,  C09D133/12 ,  C09D135/00 ,  C09D145/00 ,  C09D167/02 ,  G03F7/094 ,  G03F7/2004 ,  G03F7/2041 ,  H01L21/0276 ,  C08L2666/18 ,  C08L2666/04

Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.

Abstract translation: 提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。 本发明的优选的有机涂料组合物包含一种或多种可以在不产生裂解产物的情况下硬化的树脂。 本发明特别优选的有机涂料组合物包含一种或多种包含酸酐和羟基部分的组分。

公开(公告)号：US20060057491A1

公开(公告)日：2006-03-16

申请号：US11131908

申请日：2005-05-17

Applicant: Gerald Wayton ,  Peter Trefonas ,  Min-Ho Jung

Inventor： Gerald Wayton ,  Peter Trefonas ,  Min-Ho Jung

IPC: G03C1/76

CPC classification number: G03F7/091

Abstract: Compositions (particularly antireflective coating compositions or “ARCs”) are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. More particularly, the invention relates to organic coating compositions, particularly antireflective coating compositions, that contain a polyester resin component that contains repeat units that comprise phenolic and/or hydroxyalkylcyanurate groups.

Abstract translation: 提供组合物（特别是抗反射涂料组合物或“ARCs”），其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。 更具体地说，本发明涉及含有聚酯树脂组分的有机涂料组合物，特别是抗反射涂料组合物，其含有包含酚和/或羟烷基氰脲酸酯基团的重复单元。