发明申请
- 专利标题: METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PLASMA REACTOR
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申请号: US11612102申请日: 2006-12-18
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公开(公告)号: US20070108042A1公开(公告)日: 2007-05-17
- 发明人: Scott Hogenson , Roger Lindley , Daniel Hoffman
- 申请人: Scott Hogenson , Roger Lindley , Daniel Hoffman
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: C23C14/32
- IPC分类号: C23C14/32 ; C23C14/00 ; H05H1/24
摘要:
Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.
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