Magnetically-enhanced plasma chamber with non-uniform magnetic field
    1.
    发明授权
    Magnetically-enhanced plasma chamber with non-uniform magnetic field 失效
    具有不均匀磁场的磁增强等离子体室

    公开(公告)号:US6113731A

    公开(公告)日:2000-09-05

    申请号:US735444

    申请日:1997-01-02

    摘要: A plasma chamber having a magnet which produces a magnetic field such that, within a region parallel to and adjacent to the workpiece, the direction of the magnetic field is approximately the vector cross product of (i) the gradient of the magnitude of the magnetic field, and (ii) a vector extending perpendicularly from the workpiece surface toward the plasma. Alternatively, the plasma chamber includes a north magnetic pole and a south magnetic pole located at distinct azimuths around the periphery of the workpiece. The azimuth of the south magnetic pole relative to the north magnetic pole is clockwise around the central axis, and each magnetic pole faces a direction which is more toward than away from a central axis of the workpiece area. An additional aspect of the invention is a plasma chamber having a rotating magnetic field produced by electromagnets spaced around the periphery of the workpiece which receive successive fixed amounts of electrical current during successive time intervals. During each transition between the time intervals, the current supplied to each electromagnet is changed relatively slowly or relatively quickly according to whether the current change includes a change in polarity.

    摘要翻译: 具有磁体的等离子体室产生磁场,使得在与工件平行并邻近工件的区域内,磁场的方向近似为(i)磁场强度梯度的矢量交叉积 ,和(ii)从工件表面朝向等离子体垂直延伸的矢量。 或者,等离子体室包括北磁极和位于工件周围的不同方位角处的南磁极。 南磁极相对于北磁极的方位角是围绕中心轴顺时针旋转的,每个磁极面对的方向远离工件区域的中心轴线。 本发明的另一方面是等离子体室,其具有由围绕工件周边间隔开的电磁体产生的旋转磁场,其在连续的时间间隔期间接收连续的固定量的电流。 在时间间隔期间的每个转换期间,根据电流变化是否包括极性变化,提供给每个电磁体的电流相对缓慢或相对较快地改变。

    METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PLASMA REACTOR
    2.
    发明申请
    METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PLASMA REACTOR 有权
    在磁场增强等离子体反应器中形成磁场的方法

    公开(公告)号:US20070113980A1

    公开(公告)日:2007-05-24

    申请号:US11612129

    申请日:2006-12-18

    IPC分类号: C23F1/00

    摘要: Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.

    摘要翻译: 本文提供了用于在处理室中旋转磁场的方法。 在一个实施例中,用于旋转处理室中的磁场的方法包括形成具有初级形状的磁场; 将主要形状改变为至少两个顺序的过渡形状; 并将过渡形状改变为旋转的主要形状。 任选地,在每个步骤中,磁场可以保持在大致恒定的量级。 可选地,施加到一个或多个磁场产生线圈的最大一个电流等于零或在任何两个相邻步骤之间具有其极性反转。

    Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
    4.
    发明申请
    Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction 有权
    等离子体反应器具有最小的直流线圈,用于尖端,螺线管和镜面场,用于等离子体均匀性和器件损坏降低

    公开(公告)号:US20050167051A1

    公开(公告)日:2005-08-04

    申请号:US11046656

    申请日:2005-01-28

    IPC分类号: H01J37/32 C23F1/00

    摘要: A plasma reactor for processing a workpiece, includes a vacuum chamber defined by a sidewall and ceiling, and a workpiece support pedestal having a workpiece support surface in the chamber and facing the ceiling and including a cathode electrode. An RF power generator is coupled to the cathode electrode. Plasma distribution is controlled by an external annular inner electromagnet in a first plane overlying the workpiece support surface, an external annular outer electromagnet in a second plane overlying the workpiece support surface and having a greater diameter than the inner electromagnet, and an external annular bottom electromagnet in a third plane underlying the workpiece support surface. D.C. current supplies are connected to respective ones of the inner, outer and bottom electromagnets.

    摘要翻译: 一种用于加工工件的等离子体反应器,包括由侧壁和天花板限定的真空室,以及在所述室中具有工件支撑表面并且面向天花板并且包括阴极电极的工件支撑基座。 RF发生器耦合到阴极电极。 等离子体分布由覆盖工件支撑表面的第一平面中的外部环形内部电磁体控制,覆盖工件支撑表面并且具有比内部电磁体更大的直径的第二平面中的外部环形外部电磁体以及外部环形底部电磁体 在工件支撑表面下方的第三平面内。 内部,外部和底部电磁铁中的相应电源连接到电流源。