发明申请
- 专利标题: Non-volatile memory devices and methods of fabricating the same
- 专利标题(中): 非易失性存储器件及其制造方法
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申请号: US11403902申请日: 2006-04-14
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公开(公告)号: US20070120580A1公开(公告)日: 2007-05-31
- 发明人: Dong Kim , In-kyeong Yoo , Myoung-jae Lee , Sun-ae Seo , In-gyu Baek , Seung-eon Ahn , Byoung-ho Park , Young-kwan Cha , Sang-jin Park
- 申请人: Dong Kim , In-kyeong Yoo , Myoung-jae Lee , Sun-ae Seo , In-gyu Baek , Seung-eon Ahn , Byoung-ho Park , Young-kwan Cha , Sang-jin Park
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2005-0108125 20051111
- 主分类号: H03K19/00
- IPC分类号: H03K19/00
摘要:
A memory device may include a switching device and a storage node coupled with the switching device. The storage node may include a first electrode, a second electrode, a data storage layer and at least one contact layer. The data storage layer may be disposed between the first electrode and the second electrode and may include a transition metal oxide or aluminum oxide. The at least one contact layer may be disposed at least one of above or below the data storage layer and may include a conductive metal oxide.
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