发明申请
US20070163489A1 Method of forming a layer having a single crystalline structure 审中-公开
形成具有单晶结构的层的方法

  • 专利标题: Method of forming a layer having a single crystalline structure
  • 专利标题(中): 形成具有单晶结构的层的方法
  • 申请号: US11652619
    申请日: 2007-01-12
  • 公开(公告)号: US20070163489A1
    公开(公告)日: 2007-07-19
  • 发明人: Yong-Hoon SonJong-Wook Lee
  • 申请人: Yong-Hoon SonJong-Wook Lee
  • 优先权: KR2006-4335 20060116
  • 主分类号: C30B25/00
  • IPC分类号: C30B25/00 C30B23/00 C30B28/12
Method of forming a layer having a single crystalline structure
摘要:
A method of forming a layer, including forming an insulation layer having an opening on a single crystalline substrate, the opening partially exposing an upper face of the substrate, forming a first seed layer in the opening, converting an upper portion of the first seed layer to a first amorphous layer, converting the first amorphous layer to a second seed layer, forming a second amorphous layer on the second seed layer, and converting the second amorphous layer to a single crystalline layer.
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