发明申请
- 专利标题: Method of forming a layer having a single crystalline structure
- 专利标题(中): 形成具有单晶结构的层的方法
-
申请号: US11652619申请日: 2007-01-12
-
公开(公告)号: US20070163489A1公开(公告)日: 2007-07-19
- 发明人: Yong-Hoon Son , Jong-Wook Lee
- 申请人: Yong-Hoon Son , Jong-Wook Lee
- 优先权: KR2006-4335 20060116
- 主分类号: C30B25/00
- IPC分类号: C30B25/00 ; C30B23/00 ; C30B28/12
摘要:
A method of forming a layer, including forming an insulation layer having an opening on a single crystalline substrate, the opening partially exposing an upper face of the substrate, forming a first seed layer in the opening, converting an upper portion of the first seed layer to a first amorphous layer, converting the first amorphous layer to a second seed layer, forming a second amorphous layer on the second seed layer, and converting the second amorphous layer to a single crystalline layer.
信息查询