Invention Application
- Patent Title: Wafer dividing method and wafer dividing apparatus
- Patent Title (中): 晶圆分割方法和晶圆分割装置
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Application No.: US11650503Application Date: 2007-01-08
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Publication No.: US20070164073A1Publication Date: 2007-07-19
- Inventor: Yosuke Watanabe , Keiji Nomaru , Nobumori Ogoshi , Koichi Mitani , Taizo Kise , Kohei Matsumoto , Tatsuya Inaoka , Masaru Nakamura
- Applicant: Yosuke Watanabe , Keiji Nomaru , Nobumori Ogoshi , Koichi Mitani , Taizo Kise , Kohei Matsumoto , Tatsuya Inaoka , Masaru Nakamura
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Priority: JP2006-005893 20060113
- Main IPC: B26F3/00
- IPC: B26F3/00 ; B26F3/02

Abstract:
A method of dividing, along lattice pattern-like dividing lines, a wafer which has the lattice pattern-like dividing lines and a polymer film on the front surface of a substrate and is processed to allow for division along the dividing lines, the method comprising a frame holding step for putting the wafer on the surface of an adhesive tape mounted on an annular frame; a wafer cooling step for cooling the wafer that is affixed to the surface of the adhesive tape mounted on the annular frame; and a diving step for dividing the wafer along the dividing lines by expanding the adhesive tape to which the cooled wafer is affixed.
Public/Granted literature
- US07544587B2 Wafer dividing method and wafer dividing apparatus Public/Granted day:2009-06-09
Information query
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