Invention Application
US20070178684A1 Method for producing conductor arrays on semiconductor devices
审中-公开
在半导体器件上制造导体阵列的方法
- Patent Title: Method for producing conductor arrays on semiconductor devices
- Patent Title (中): 在半导体器件上制造导体阵列的方法
-
Application No.: US11344961Application Date: 2006-01-31
-
Publication No.: US20070178684A1Publication Date: 2007-08-02
- Inventor: Torsten Mueller , Josef Willer , Stephanie Iacono
- Applicant: Torsten Mueller , Josef Willer , Stephanie Iacono
- Main IPC: H01L21/44
- IPC: H01L21/44
Abstract:
A periodic pattern of conductor tracks with broader interspaces is produced by the application of a totally periodic pattern and subsequent removal of individual conductor tracks. An alternative method comprises the formation of a completely periodic hardmask, from which individual parts are removed. The modified hardmask is then used to etch a periodic pattern of conductor tracks with intermediate broader spaces.
Information query
IPC分类:
