Method for producing conductor arrays on semiconductor devices
    1.
    发明申请
    Method for producing conductor arrays on semiconductor devices 审中-公开
    在半导体器件上制造导体阵列的方法

    公开(公告)号:US20070178684A1

    公开(公告)日:2007-08-02

    申请号:US11344961

    申请日:2006-01-31

    IPC分类号: H01L21/44

    摘要: A periodic pattern of conductor tracks with broader interspaces is produced by the application of a totally periodic pattern and subsequent removal of individual conductor tracks. An alternative method comprises the formation of a completely periodic hardmask, from which individual parts are removed. The modified hardmask is then used to etch a periodic pattern of conductor tracks with intermediate broader spaces.

    摘要翻译: 具有较宽空间的导体轨迹的周期性图案通过施加全周期图案并随后移除各个导体轨迹来产生。 一种替代方法包括形成完全周期性的硬掩模,从其中去除各个部件。 然后使用改进的硬掩模来蚀刻具有中间较宽空间的导体轨迹的周期性图案。