发明申请
US20070190235A1 FILM FORMING APPARATUS, FILM FORMING METHOD, AND MANUFACTURING METHOD OF LIGHT EMITTING ELEMENT
审中-公开
薄膜成型装置,薄膜成型方法和发光元件的制造方法
- 专利标题: FILM FORMING APPARATUS, FILM FORMING METHOD, AND MANUFACTURING METHOD OF LIGHT EMITTING ELEMENT
- 专利标题(中): 薄膜成型装置,薄膜成型方法和发光元件的制造方法
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申请号: US11671225申请日: 2007-02-05
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公开(公告)号: US20070190235A1公开(公告)日: 2007-08-16
- 发明人: Shunpei YAMAZAKI , Junichiro SAKATA , Yoshiaki YAMAMOTO , Miki KATAYAMA , Kohei YOKOYAMA , Rie MATSUBARA , Takahiro KAWAKAMI
- 申请人: Shunpei YAMAZAKI , Junichiro SAKATA , Yoshiaki YAMAMOTO , Miki KATAYAMA , Kohei YOKOYAMA , Rie MATSUBARA , Takahiro KAWAKAMI
- 申请人地址: JP Atsugi-shi
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP2006-034510 20060210; JP2006-034514 20060210
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; B05D5/06 ; C23C8/00 ; C23C16/00
摘要:
An object of the present invention is to provide a film forming method for forming a film with reduced defect and to provide a film forming method for forming a film with a uniform quality. In addition, another object is to provide a manufacturing method of a light emitting element which can be driven with low voltage. Further, another object is to provide a manufacturing method of a light emitting element with high light emission efficiency. A film with reduced defect and a uniform quality can be formed by fixing a substrate to a substrate holding unit so that at least a part of a surface of the substrate is exposed, evaporating a vapor deposition material from an evaporation source filled with the vapor deposition material, irradiating the vapor deposition material which is evaporated with a laser beam, and depositing the vapor deposition material on the surface of the substrate.
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