发明申请
- 专利标题: Semiconductor devices
- 专利标题(中): 半导体器件
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申请号: US11802810申请日: 2007-05-25
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公开(公告)号: US20070221924A1公开(公告)日: 2007-09-27
- 发明人: Takasumi Ohyanagi , Atsuo Watanabe , Rajesh Malhan , Tsuyoshi Yamamoto , Toshiyuki Morishita
- 申请人: Takasumi Ohyanagi , Atsuo Watanabe , Rajesh Malhan , Tsuyoshi Yamamoto , Toshiyuki Morishita
- 优先权: JP2004-272955 20040921
- 主分类号: H01L29/772
- IPC分类号: H01L29/772
摘要:
A silicon carbide semiconductor device such as JFET, SIT and the like is provided for accomplishing a reduction in on-resistance and high-speed switching operations. In the JFET or SIT which turns on/off a current with a depletion layer extending in a channel between a gate region formed along trench grooves, a gate contact layer and a gate electrode, which can be supplied with voltages from the outside, are formed on one surface of a semiconductor substrate or on the bottom of the trench groove. A metal conductor (virtual gate electrode) is formed in ohmic contact with a p++ contact layer of the gate region on the bottom of the trench grooves independently of the gate electrode. The virtual gate electrode is electrically isolated from the gate electrode and an external wire.
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