发明申请
US20070257282A1 Image Sensor Applying Power Voltage to Backside of Semiconductor Substrate and Method of Manufacturing Image Sensor
审中-公开
图像传感器将电源电压施加到半导体基板的背面和制造图像传感器的方法
- 专利标题: Image Sensor Applying Power Voltage to Backside of Semiconductor Substrate and Method of Manufacturing Image Sensor
- 专利标题(中): 图像传感器将电源电压施加到半导体基板的背面和制造图像传感器的方法
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申请号: US11672866申请日: 2007-02-08
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公开(公告)号: US20070257282A1公开(公告)日: 2007-11-08
- 发明人: Yo-han Sun , Jong-jin Lee , Bum-suk Kim , Yun-ho Jang , Sae-young Kim , Keun-chan Yuk , Getman Alexander
- 申请人: Yo-han Sun , Jong-jin Lee , Bum-suk Kim , Yun-ho Jang , Sae-young Kim , Keun-chan Yuk , Getman Alexander
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co, Ltd.
- 当前专利权人: Samsung Electronics Co, Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2006-0012044 20060208
- 主分类号: H01L27/148
- IPC分类号: H01L27/148 ; H01L21/339
摘要:
An image sensor applying a power voltage to a backside of a semiconductor substrate includes a first type semiconductor substrate, a first type semiconductor layer formed on the first type semiconductor substrate, a second type semiconductor layer formed on the first type semiconductor layer, and a power voltage receiver formed on a backside of the first type semiconductor substrate opposite the first type semiconductor layer with respect to the first type semiconductor substrate, wherein the power voltage receiver receives a power voltage from outside and applies the power voltage to the first type semiconductor substrate.
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