发明申请
- 专利标题: METHOD, APPARATUS AND SYSTEM FOR USE IN PROCESSING WAFERS
- 专利标题(中): 用于处理波形的方法,装置和系统
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申请号: US11829798申请日: 2007-07-27
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公开(公告)号: US20070269986A1公开(公告)日: 2007-11-22
- 发明人: William Kalenian , Tom Walsh , Dave Halley
- 申请人: William Kalenian , Tom Walsh , Dave Halley
- 申请人地址: US CA San Luis Obispo
- 专利权人: STRASBAUGH
- 当前专利权人: STRASBAUGH
- 当前专利权人地址: US CA San Luis Obispo
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.
公开/授权文献
- US08052504B2 Method, apparatus and system for use in processing wafers 公开/授权日:2011-11-08
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