METHOD, APPARATUS AND SYSTEM FOR USE IN PROCESSING WAFERS
    1.
    发明申请
    METHOD, APPARATUS AND SYSTEM FOR USE IN PROCESSING WAFERS 有权
    用于处理波形的方法,装置和系统

    公开(公告)号:US20070269986A1

    公开(公告)日:2007-11-22

    申请号:US11829798

    申请日:2007-07-27

    IPC分类号: H01L21/302

    摘要: The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.

    摘要翻译: 本实施例提供了用于处理诸如晶片的物体的方法和系统,包括抛光和/或研磨晶片。 一些实施例提供了包括前端模块和处理模块的系统。 前端模块与存储用于处理的对象的存储设备耦合。 前端模块可以包括单个机器人,传送站和多个端部执行器。 处理模块与前端模块耦合,使得单个机器人将物体从存储装置传送到处理模块。 所述处理模块包括旋转台和具有承载件的主轴,所述托架被配置为检索所递送的物体并且处理所述旋转台上的物体。

    Method, apparatus and system for use in processing wafers

    公开(公告)号:US20060035563A1

    公开(公告)日:2006-02-16

    申请号:US11173992

    申请日:2005-07-01

    IPC分类号: B24B51/00

    摘要: The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.

    Method, apparatus and system for use in processing wafers
    3.
    发明授权
    Method, apparatus and system for use in processing wafers 有权
    用于处理晶片的方法,设备和系统

    公开(公告)号:US08052504B2

    公开(公告)日:2011-11-08

    申请号:US11829798

    申请日:2007-07-27

    IPC分类号: B24B49/00

    摘要: The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.

    摘要翻译: 本实施例提供了用于处理诸如晶片的物体的方法和系统,包括抛光和/或研磨晶片。 一些实施例提供了包括前端模块和处理模块的系统。 前端模块与存储用于处理的对象的存储设备耦合。 前端模块可以包括单个机器人,传送站和多个端部执行器。 处理模块与前端模块耦合,使得单个机器人将物体从存储装置传送到处理模块。 所述处理模块包括旋转台和具有承载件的主轴,所述托架被配置为检索所递送的物体并且处理所述旋转台上的物体。

    Method, apparatus and system for use in processing wafers
    4.
    发明授权
    Method, apparatus and system for use in processing wafers 有权
    用于处理晶片的方法,设备和系统

    公开(公告)号:US08565919B2

    公开(公告)日:2013-10-22

    申请号:US13290900

    申请日:2011-11-07

    IPC分类号: B65H1/00 G06F19/00

    摘要: The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.

    摘要翻译: 本实施例提供了用于处理诸如晶片的物体的方法和系统,包括抛光和/或研磨晶片。 一些实施例提供了包括前端模块和处理模块的系统。 前端模块与存储用于处理的对象的存储设备耦合。 前端模块可以包括单个机器人,传送站和多个端部执行器。 处理模块与前端模块耦合,使得单个机器人将物体从存储装置传送到处理模块。 所述处理模块包括旋转台和具有承载件的主轴,所述托架被配置为检索所递送的物体并且处理所述旋转台上的物体。

    METHOD, APPARATUS AND SYSTEM FOR USE IN PROCESSING WAFERS
    5.
    发明申请
    METHOD, APPARATUS AND SYSTEM FOR USE IN PROCESSING WAFERS 有权
    用于处理波形的方法,装置和系统

    公开(公告)号:US20120046781A1

    公开(公告)日:2012-02-23

    申请号:US13290900

    申请日:2011-11-07

    IPC分类号: G06F19/00

    摘要: The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.

    摘要翻译: 本实施例提供了用于处理诸如晶片的物体的方法和系统,包括抛光和/或研磨晶片。 一些实施例提供了包括前端模块和处理模块的系统。 前端模块与存储用于处理的对象的存储设备耦合。 前端模块可以包括单个机器人,传送站和多个端部执行器。 处理模块与前端模块耦合,使得单个机器人将物体从存储装置传送到处理模块。 所述处理模块包括旋转台和具有承载件的主轴,所述托架被配置为检索所递送的物体并且处理所述旋转台上的物体。