发明申请
- 专利标题: LATERAL SILICIDED DIODES
- 专利标题(中): 横向硅胶二极管
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申请号: US11944839申请日: 2007-11-26
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公开(公告)号: US20080067623A1公开(公告)日: 2008-03-20
- 发明人: Douglas Coolbaugh , Jeffrey Johnson , Xuefeng Liu , Bradley Orner , Robert Rassel , David Sheridan
- 申请人: Douglas Coolbaugh , Jeffrey Johnson , Xuefeng Liu , Bradley Orner , Robert Rassel , David Sheridan
- 主分类号: H01L29/872
- IPC分类号: H01L29/872
摘要:
A structure and method of fabricating lateral diodes. The diodes include Schottky diodes and PIN diodes. The method of fabrication includes forming one or more doped regions and more trenches in a silicon substrate and forming metal silicides on the sidewalls of the trenches. The fabrication of lateral diodes may be integrated with the fabrication of field effect, bipolar and SiGe bipolar transistors.
公开/授权文献
- US07381997B2 Lateral silicided diodes 公开/授权日:2008-06-03
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