发明申请
US20080081391A1 MEMS Device with Roughened Surface and Method of Producing the Same
有权
具有粗糙表面的MEMS器件及其制造方法
- 专利标题： MEMS Device with Roughened Surface and Method of Producing the Same
- 专利标题（中）： 具有粗糙表面的MEMS器件及其制造方法
-
申请号： US11538281申请日： 2006-10-03
-
公开(公告)号： US20080081391A1公开(公告)日： 2008-04-03
- 发明人: John R. Martin , Thomas D. Chen , Jinbo Kuang , Thomas Kieran Nunan , Xin Zhang
- 申请人： John R. Martin , Thomas D. Chen , Jinbo Kuang , Thomas Kieran Nunan , Xin Zhang
- 申请人地址： US MA Norwood
- 专利权人： ANALOG DEVICES, INC.
- 当前专利权人： ANALOG DEVICES, INC.
- 当前专利权人地址： US MA Norwood
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method of producing a MEMS device provides a MEMS apparatus having released structure. The MEMS apparatus is formed at least in part from an SOI wafer having a first layer, a second layer spaced from the first layer, and an insulator layer between the first layer and second layer. The first layer has a top surface, while the second layer has a bottom surface facing the top surface. After providing the MEMS apparatus, the method increases the roughness of at least the top surface of the first layer or the bottom surface of the second layer.
公开/授权文献
信息查询
IPC分类:
