摘要:
A method of producing a MEMS device provides a MEMS apparatus having released structure. The MEMS apparatus is formed at least in part from an SOI wafer having a first layer, a second layer spaced from the first layer, and an insulator layer between the first layer and second layer. The first layer has a top surface, while the second layer has a bottom surface facing the top surface. After providing the MEMS apparatus, the method increases the roughness of at least the top surface of the first layer or the bottom surface of the second layer.
摘要:
A method of producing a MEMS device provides a MEMS apparatus having released structure. The MEMS apparatus is formed at least in part from an SOI wafer having a first layer, a second layer spaced from the first layer, and an insulator layer between the first layer and second layer. The first layer has a top surface, while the second layer has a bottom surface facing the top surface. After providing the MEMS apparatus, the method increases the roughness of at least the top surface of the first layer or the bottom surface of the second layer.
摘要:
A coupling apparatus allows anti-phase movements of inertial sensor element frames along parallel axes but substantially prevents in-phase movements of the frames. The coupling apparatus includes a bar coupled between first and second sensor element frames and at least one supporting structure supporting the bar. The at least one structure is coupled to a substrate underlying the frames. The structures allow the bar to rotate at a pivot point when the frames move in anti-phase to one another along substantially parallel axes but substantially prevent in-phase movements of the frames.
摘要:
Inertial sensors with reduced sensitivity to quadrature errors and micromachining inaccuracies include a gyroscope incorporating two specially-configured single-axis gyroscopes for sensing rotations about two orthogonal axes (the axes of sensitivity) in the device plane, where each single-axis gyroscope includes a resonator having two rotationally-dithered shuttles interconnected by a fork and each shuttle is configured to tilt out-of-plane along a tilt axis perpendicular to the axis of sensitivity and includes corresponding Coriolis sensing electrodes positioned along an axis perpendicular to the tilt axis (i.e., parallel to the axis of sensitivity). The two single-axis gyroscopes may be interconnected, e.g., by one or more in-phase or anti-phase couplings interconnecting the forks and/or the shuttles.
摘要:
An inertial sensor includes driving piezoelectric transducers for enabling an oscillation of a resonator, sensing piezoelectric transducers for enabling a detection of a movement of the inertial sensor, and piezoelectric compensating elements substantially equidistantly among the driving and the sensing piezoelectric transducers, wherein the compensating elements and the resonator form corresponding capacitors having capacitive gaps, and wherein, during the oscillation of the resonator, changes in electrostatic charges stored in the capacitors are measured with the compensating elements and are modified so as to modify the oscillation of the resonator.
摘要:
An inertial sensor includes a cross-quad configuration of four interconnected sensor elements. Each sensor element has a frame and a resonator suspended within the frame. The sensor elements are arranged so that the frames of adjacent sensor elements are allowed to move in anti-phase to one another but are substantially prevented from moving in phase with one another. The sensor elements may be configured in a horizontally coupled arrangement, a vertically coupled arrangement, or a fully coupled arrangement. A pair of sensor elements may be vertically coupled.
摘要:
An inertial sensor includes driving piezoelectric transducers for enabling an oscillation of a resonator, sensing piezoelectric transducers for enabling a detection of a movement of the inertial sensor, and piezoelectric compensating elements substantially equidistantly among the driving and the sensing piezoelectric transducers, wherein the compensating elements and the resonator form corresponding capacitors having capacitive gaps, and wherein, during the oscillation of the resonator, changes in electrostatic charges stored in the capacitors are measured with the compensating elements and are modified so as to modify the oscillation of the resonator.
摘要:
In a micromachined devices having a movable shuttle driven in oscillation, measuring the electrical charge accumulated on opposing drive capacitors to determine the displacement of the movable shuttle. Alternately, in such a micromachined device, measuring the electrical charge accumulated on a drive capacitor and comparing the measured electrical charge to a nominal electrical charge to determine the displacement of the movable shuttle.
摘要:
A coupling apparatus allows anti-phase movements of inertial sensor element frames along parallel axes but substantially prevents in-phase movements of the frames. The coupling apparatus includes a bar coupled between first and second sensor element frames and at least one supporting structure supporting the bar. The at least one structure is coupled to a substrate underlying the frames. The structures allow the bar to rotate at a pivot point when the frames move in anti-phase to one another along substantially parallel axes but substantially prevent in-phase movements of the frames.
摘要:
In a micromachined devices having a movable shuttle driven in oscillation, measuring the electrical charge accumulated on opposing drive capacitors to determine the displacement of the movable shuttle. Alternately, in such a micromachined device, measuring the electrical charge accumulated on a drive capacitor and comparing the measured electrical charge to a nominal electrical charge to determine the displacement of the movable shuttle.