发明申请
- 专利标题: Charged particle beam apparatus and dimension measuring method
- 专利标题(中): 带电粒子束装置和尺寸测量方法
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申请号: US11723457申请日: 2007-03-20
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公开(公告)号: US20080100832A1公开(公告)日: 2008-05-01
- 发明人: Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
- 申请人: Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JPJP2004-292772 20041005
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N23/00
摘要:
There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.
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