发明申请
US20080132068A1 Damascene metal-insulator-metal (MIM) device 有权
大马士革金属绝缘子金属(MIM)器件

Damascene metal-insulator-metal (MIM) device
摘要:
The present method of fabricating a memory device includes the steps of providing a dielectric layer, providing an opening in the dielectric layer, providing a first conductive body in the opening in the dielectric layer, providing a switching body in the opening, and providing a second conductive body in the opening.
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