发明申请
- 专利标题： Apparatus configured to position a workpiece
- 专利标题（中）： 被配置为定位工件的装置
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申请号： US12068071申请日： 2008-02-01
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公开(公告)号： US20080174750A1公开(公告)日： 2008-07-24
- 发明人: Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
- 申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03077701.5 20030829
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
公开/授权文献
- US07679720B2 Apparatus configured to position a workpiece 公开/授权日：2010-03-16
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