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公开(公告)号：US07679720B2
公开(公告)日：2010-03-16
申请号：US12068071
申请日：2008-02-01
Applicant: Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
Inventor： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
CPC classification number: G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
Abstract translation: 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。
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公开(公告)号：US06879377B2
公开(公告)日：2005-04-12
申请号：US10305266
申请日：2002-11-27
Applicant: Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
Inventor： Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
IPC: G03F7/20 , H01L21/027 , G03B27/42 , G03B27/58
CPC classification number: G03F7/70991
Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
Abstract translation: 光刻投影装置包括向诸如对象台，相关联的电动机或传感器的真空室中的可移动部件供应电力的导管。 导管包括柔性金属波纹管，以防止由于真空室中的真空引起的导管的泄气，同时允许可移动部件以至少第一自由度的运动。
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公开(公告)号：US20080174750A1
公开(公告)日：2008-07-24
申请号：US12068071
申请日：2008-02-01
Applicant: Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
Inventor： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
IPC: G03B27/52
CPC classification number: G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
Abstract translation: 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。
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公开(公告)号：US07359032B2
公开(公告)日：2008-04-15
申请号：US10925148
申请日：2004-08-25
Applicant: Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
Inventor： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
CPC classification number: G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.
Abstract translation: 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。 第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。 该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。 底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。
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