发明申请
- 专利标题: MELT-BASED PATTERNING FOR ELECTRONIC DEVICES
- 专利标题(中): 用于电子设备的基于MELT的图案
-
申请号: US11871135申请日: 2007-10-11
-
公开(公告)号: US20080220561A1公开(公告)日: 2008-09-11
- 发明人: Siegfried F. Karg , Heike E. Riel , Walter H. Riess
- 申请人: Siegfried F. Karg , Heike E. Riel , Walter H. Riess
- 优先权: EP03405403.1 20030603; EP03019744.6 20030829
- 主分类号: H01L51/40
- IPC分类号: H01L51/40 ; B05D5/12 ; B05C5/00
摘要:
The present invention provides methods and apparatus for melt-based patterning for electronic devices. It employs and provides processes and apparatus for fabricating an electronic device having a pattern formed on a surface by a deposition material. Further, the invention a process for fabricating semiconductors, organic light-emitting devices (OLEDs), field-effect transistors, and in particular high-resolution patterning for RGB displays. A process for fabricating an organic electronic device includes the steps of heating and applying a pressure to the deposition material to form a melt, and depositing the melted deposition material on the surface with a phase-change printing technique or a spray technique. The melted deposition material solidifies on the surface.
信息查询
IPC分类: