发明申请
- 专利标题： Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
- 专利标题（中）： 光刻胶组合物及使用其制造薄膜晶体管基板的方法
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申请号： US12082436申请日： 2008-04-11
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公开(公告)号： US20080254634A1公开(公告)日： 2008-10-16
- 发明人: Jeong-Min Park , Doo-Hee Jung , Hi-Kuk Lee , Hyoc-Min Youn , Ki-Hyuk Koo
- 申请人： Jeong-Min Park , Doo-Hee Jung , Hi-Kuk Lee , Hyoc-Min Youn , Ki-Hyuk Koo
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 优先权： KR2007-0036565 20070413
- 主分类号： H01L21/311
- IPC分类号： H01L21/311 ; G03F7/004
摘要：
In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.
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