发明申请
- 专利标题： Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
- 专利标题（中）： 清洁装置，光刻设备和光刻设备清洁方法
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申请号： US11819949申请日： 2007-06-29
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公开(公告)号： US20080273181A1公开(公告)日： 2008-11-06
- 发明人: Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
- 申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
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