发明申请
- 专利标题： Novel Methodology To Realize Automatic Virtual Metrology
- 专利标题（中）： 实现自动虚拟计量的新方法
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申请号： US12025933申请日： 2008-02-05
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公开(公告)号： US20080275586A1公开(公告)日： 2008-11-06
- 发明人: Francis Ko , Chih-Wei Lai , Kewei Zuo , Henry Lo , Jean Wang , Ping-Hsu Chen , Chun-Hsien Lin , Chen-Hua Yu
- 申请人： Francis Ko , Chih-Wei Lai , Kewei Zuo , Henry Lo , Jean Wang , Ping-Hsu Chen , Chun-Hsien Lin , Chen-Hua Yu
- 申请人地址： TW Hsin-Chu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： G06F17/00
- IPC分类号： G06F17/00
摘要：
A method to enable wafer result prediction includes collecting manufacturing data from various semiconductor manufacturing tools and metrology tools; choosing key parameters using an autokey method based on the manufacturing data; building a virtual metrology based on the key parameters; and predicting wafer results using the virtual metrology.
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