发明申请
- 专利标题: APPARATUS FOR STORING SUBSTRATES
- 专利标题(中): 储存基材的装置
-
申请号: US11755508申请日: 2007-05-30
-
公开(公告)号: US20080295412A1公开(公告)日: 2008-12-04
- 发明人: Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
- 申请人: Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 主分类号: E06B7/16
- IPC分类号: E06B7/16 ; H01L21/00
摘要:
An apparatus includes an enclosure and a door configured to seal the enclosure. The door includes a plate. A rotational apparatus is disposed over the plate. At least one first member with a first arm extends from a first rib of the first member. At least one second member with a second arm extends from a second rib of the second member. The first and second arms are connected to the rotational apparatus. At least one corner member has a first edge. The first edge has a shape corresponding to a shape of a corner of the frame. The corner member is connected to a first end of the third arm. A second end of the third arm is connected to the rotational apparatus. A sealing material is disposed along a first longitudinal side of the first rib and a second longitudinal side of the second rib.
公开/授权文献
- US08109407B2 Apparatus for storing substrates 公开/授权日:2012-02-07
信息查询