发明申请
US20080298933A1 SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME
有权
底板承载器,端口装置和设备接口以及包括其中的设备
- 专利标题: SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME
- 专利标题(中): 底板承载器,端口装置和设备接口以及包括其中的设备
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申请号: US11754789申请日: 2007-05-29
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公开(公告)号: US20080298933A1公开(公告)日: 2008-12-04
- 发明人: Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
- 申请人: Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
- 申请人地址: TW Hsin-Chu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsin-Chu
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.
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