发明申请
- 专利标题： METHOD AND APPARATUS FOR OPTICALLY ANALYZING A SURFACE
- 专利标题（中）： 用于光学分析表面的方法和装置
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申请号： US12140154申请日： 2008-06-16
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公开(公告)号： US20080304078A1公开(公告)日： 2008-12-11
- 发明人: Klaus Freishlad , Shouhong Tang
- 申请人： Klaus Freishlad , Shouhong Tang
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人： KLA-Tencor Technologies Corporation
- 当前专利权人地址： US CA Milpitas
- 主分类号： G01B11/02
- IPC分类号： G01B11/02
摘要：
In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.
公开/授权文献
- US07583386B2 Method and apparatus for optically analyzing a surface 公开/授权日：2009-09-01
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