发明申请
- 专利标题: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- 专利标题(中): 检测方法和装置,光刻设备,光刻处理单元和器件制造方法
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申请号: US11808922申请日: 2007-06-13
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公开(公告)号: US20080311344A1公开(公告)日: 2008-12-18
- 发明人: Antoine Gaston Marie Kiers , Arie Jeffrey Den Boef , Maurits Van Der Schaar
- 申请人: Antoine Gaston Marie Kiers , Arie Jeffrey Den Boef , Maurits Van Der Schaar
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; B32B7/02 ; B41L17/00 ; G01N21/01 ; G01N23/20
摘要:
An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic array is desirably made of two interlaced gratings, one of the gratings having a different pitch from the other grating in order to create an asymmetry in the array. This asymmetry can then be measured by measuring the diffraction spectra of radiation reflected from the overlay target. Variation in the asymmetry indicates the presence of an overlay error in layers on the substrate, where overlay targets are printed on subsequent layers.
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