发明申请
- 专利标题： Cleaning Method and Plasma Processing Method
- 专利标题（中）： 清洁方法和等离子体处理方法
-
申请号： US11883523申请日： 2006-01-23
-
公开(公告)号： US20080317975A1公开(公告)日： 2008-12-25
- 发明人: Shingo Furui , Takashi Kobayashi , Junichi Kitagawa
- 申请人： Shingo Furui , Takashi Kobayashi , Junichi Kitagawa
- 优先权： JP2005-026589 20050202
- 国际申请： PCT/JP2006/300957 WO 20060123
- 主分类号： C23C16/511
- IPC分类号： C23C16/511 ; B08B5/00 ; C23C16/00 ; C23C16/513
摘要：
In a RLSA microwave plasma processing apparatus that radiates microwave from a microwave generator into a chamber by using a planer antenna (Radial Line Slot Antenna) having many slots formed according to a certain pattern, the chamber contaminated with Na or the like is cleaned by using a cleaning gas containing H2 and O2.
公开/授权文献
- US08034183B2 Cleaning method and plasma processing method 公开/授权日：2011-10-11
信息查询
IPC分类:
