Invention Application
- Patent Title: High-output diamond semiconductor element
- Patent Title (中): 高输出金刚石半导体元件
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Application No.: US12153752Application Date: 2008-05-23
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Publication No.: US20090050899A1Publication Date: 2009-02-26
- Inventor: Kazuhiro Ikeda , Hitoshi Umezawa , Shinichi Shikata , Ramanujam Kumaresan , Natsuo Tatsumi
- Applicant: Kazuhiro Ikeda , Hitoshi Umezawa , Shinichi Shikata , Ramanujam Kumaresan , Natsuo Tatsumi
- Assignee: National Institute of Advanced Industrial Scinece and Technology
- Current Assignee: National Institute of Advanced Industrial Scinece and Technology
- Priority: JPP.2007-217412 20070823; JPP.2007-251370 20070927
- Main IPC: H01L29/15
- IPC: H01L29/15

Abstract:
The present invention relates to a high-output diamond semiconductor element, including a Schottky electrode as a cathode, a diamond P− drift layer, a diamond p+ ohmic layer, an ohmic electrode as an anode, and an insulating film layer disposed to surround a circumference of the Schottky electrode. It also relates to a high-output diamond semiconductor element, including a Schottky electrode as a cathode, a diamond P− drift layer, a diamond p+ ohmic layer, an ohmic electrode as an anode, a dielectric layer disposed on a part of a junction surface of the Schottky electrode and the diamond p− drift layer, and a field plate containing a conductor, the field plate being disposed on an external surface of the dielectric layer to surround a circumference of the Schottky electrode.
Information query
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