发明申请
- 专利标题： POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE
- 专利标题（中）： 抛光组合物和利用氨基硅烷处理的磨料颗粒的方法
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申请号： US12234173申请日： 2008-09-19
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公开(公告)号： US20090081871A1公开(公告)日： 2009-03-26
- 发明人: Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
- 申请人： Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 主分类号： H01L21/304
- IPC分类号： H01L21/304 ; C09K3/14
摘要：
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.
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