发明申请
- 专利标题: METHOD FOR FABRICATING PIXEL STRUCTURE
- 专利标题(中): 制造像素结构的方法
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申请号: US12017342申请日: 2008-01-22
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公开(公告)号: US20090087954A1公开(公告)日: 2009-04-02
- 发明人: Han-Tu Lin , Chih-Chun Yang , Ming-Yuan Huang , Chih-Hung Shih , Ta-Wen Liao , Chia-Chi Tsai
- 申请人: Han-Tu Lin , Chih-Chun Yang , Ming-Yuan Huang , Chih-Hung Shih , Ta-Wen Liao , Chia-Chi Tsai
- 申请人地址: TW Hsinchu
- 专利权人: AU OPTRONICS CORPORATION
- 当前专利权人: AU OPTRONICS CORPORATION
- 当前专利权人地址: TW Hsinchu
- 优先权: TW96136778 20071001
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for fabricating a pixel structure using a laser ablation process is provided. This fabrication method forms a gate, a channel layer, a source, a drain, a passivation layer, and a pixel electrode sequentially by using a laser ablation process. Particularly, the fabrication method is not similar to a photolithography and etching process, so as to reduce the complicated photolithography and etching processes, such as spin coating process, soft-bake, hard-bake, exposure, developing, etching, and stripping. Therefore, the fabrication method simplifies the process and thus reduces the fabrication cost.
公开/授权文献
- US07682884B2 Method for fabricating pixel structure 公开/授权日:2010-03-23
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