发明申请
- 专利标题: SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件
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申请号: US12275995申请日: 2008-11-21
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公开(公告)号: US20090134446A1公开(公告)日: 2009-05-28
- 发明人: Katsuyuki SEKINE , Yoshio OZAWA , Hiroaki TSUNODA
- 申请人: Katsuyuki SEKINE , Yoshio OZAWA , Hiroaki TSUNODA
- 优先权: JP2007-303302 20071122
- 主分类号: H01L29/788
- IPC分类号: H01L29/788 ; H01L29/68 ; H01L29/66
摘要:
A semiconductor device includes a tunnel insulating film formed on a semiconductor substrate, a floating gate electrode formed on the tunnel insulating film, an inter-electrode insulating film formed on the floating gate electrode, and a control gate electrode formed on the inter-electrode insulating film, wherein the inter-electrode insulating film includes a main insulating film and a plurality of nano-particles in the main insulating film.
公开/授权文献
- US07928500B2 Semiconductor device 公开/授权日:2011-04-19
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