发明申请
- 专利标题: Substrate Processing Apparatus and Device Manufacturing Method
- 专利标题(中): 基板加工装置及装置制造方法
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申请号: US12271362申请日: 2008-11-14
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公开(公告)号: US20090148604A1公开(公告)日: 2009-06-11
- 发明人: Raimond VISSER , Pieter Renaat Maria Hennus , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
- 申请人: Raimond VISSER , Pieter Renaat Maria Hennus , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: B05D3/00
- IPC分类号: B05D3/00 ; C23C14/00
摘要:
An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.