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    Substrate Processing Apparatus and Device Manufacturing Method
    1.
    发明申请
    Substrate Processing Apparatus and Device Manufacturing Method 审中-公开
    基板加工装置及装置制造方法

    公开(公告)号：US20090148604A1

    公开(公告)日：2009-06-11

    申请号：US12271362

    申请日：2008-11-14

    申请人： Raimond VISSER ,  Pieter Renaat Maria Hennus ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    发明人： Raimond VISSER ,  Pieter Renaat Maria Hennus ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    IPC分类号： B05D3/00 ,  C23C14/00

    CPC分类号： H01L21/67201 ,  G03F7/70841

    摘要： An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.

    摘要翻译： 示例性的基板处理装置具有真空室和用于除气的装载锁。 负载锁具有支撑台以支撑基板。 盖板可以设置在装载锁中，盖板具有面向支撑台的上表面的下表面。 可以在盖板的下表面中设置开口，以允许基本上垂直于下表面的方向从基板上除去气体。 在一个实施例中，支撑台的上表面和基板之间的气体压力最初通过开口减小到低于同时的负载锁定压力的一定压力。 当负载锁定压力的其余部分已经下降到特定值以下时，支撑台的上表面和基板之间的气体压力与剩余的负载锁定压力一起减小。

    Method and apparatus for positioning a substrate on a substrate table
    3.
    发明授权
    Method and apparatus for positioning a substrate on a substrate table 失效
    将基板定位在基板台上的方法和装置

    公开(公告)号：US07405810B2

    公开(公告)日：2008-07-29

    申请号：US10875537

    申请日：2004-06-25

    申请人： Pieter Renaat Maria Hennus ,  Jacob Willem Vink

    发明人： Pieter Renaat Maria Hennus ,  Jacob Willem Vink

    IPC分类号： G03B27/62 ,  G03B27/42 ,  G03B27/32

    CPC分类号： G03F7/70633 ,  G03F7/70716 ,  G03F9/7011 ,  G03F9/7015

    摘要： The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.

    摘要翻译： 本发明涉及一种用于相对于衬底台定位衬底的方法。 当衬底首次位于衬底台上时，确定衬底相对于衬底台的第一相对位置。 当衬底位于衬底台上第二个随后的时间时，确定衬底相对于衬底台的第二相对位置，并且基于第一和第二相对位置来调整衬底台相对于衬底的位置 位置，使得基底相对于基底台基本上等于第一相对位置。

    Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof
    4.
    发明授权
    Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof 有权
    用于传送物体的传送设备，使用这种传送设备的光刻设备及其使用方法

    公开(公告)号：US07397539B2

    公开(公告)日：2008-07-08

    申请号：US10806345

    申请日：2004-03-23

    申请人： Marcus Johannes Henricus Willems Van Dijk ,  Pieter Renaat Maria Hennus

    发明人： Marcus Johannes Henricus Willems Van Dijk ,  Pieter Renaat Maria Hennus

    IPC分类号： G03B27/58 ,  G03B27/62 ,  G03B27/42

    CPC分类号： G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  H01L21/6833 ,  H02N13/00

    摘要： The invention relates to a transfer apparatus for transferring an object. The transfer apparatus comprises a gripper for either gripping the object at a first position and then releasing the object at a second position proximate to a receiving structure or releasing the object at a first position after gripping the object at a second position proximate to the receiver structure. The transfer apparatus also includes a measurement device arranged to measure the relative position of the gripper with respect to the receiving structure in at least one dimension. Further, a relative position error is determined with respect to a desired relative position based on the relative position measured. The relative position of the gripper and receiving structure are adjusted in order to minimize the relative position error in the second position.

    摘要翻译： 本发明涉及一种用于传送物体的传送装置。 传送装置包括夹具，用于在第一位置处夹持物体，然后在靠近接收结构的第二位置处释放物体，或者在靠近接收器结构的第二位置夹持物体之后在第一位置释放物体 。 传送装置还包括测量装置，该测量装置布置成在至少一个维度上测量夹具相对于接收结构的相对位置。 此外，基于测量的相对位置，相对于期望的相对位置确定相对位置误差。 调整夹持器和接收结构的相对位置，以便最小化第二位置中的相对位置误差。