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发明申请
US20090162800A1 Process for Imaging a Photoresist Coated over an Antireflective Coating 审中-公开
在抗反射涂层上涂覆光刻胶的方法

Process for Imaging a Photoresist Coated over an Antireflective Coating
摘要：
The process of the present invention relates to imaging a photoresist film coated over an antireflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing the antireflective film treated with an aqueous rinsing solution, d) forming a coating of a photoresist over the film of the antireflective coating composition, e) imagewise exposing the photoresist film, and, f) developing the photoresist with an aqueous alkaline developing solution.
摘要（中）：

本发明的方法涉及对涂覆在抗反射涂膜上的光致抗蚀剂膜进行成像，其包括：a）从防反射涂料组合物形成抗反射涂膜，其中组合物包含硅氧烷聚合物，b）用碱性水溶液处理抗反射膜 处理溶液，c）冲洗用水性漂洗溶液处理的抗反射膜，d）在抗反射涂料组合物的膜上形成光致抗蚀剂涂层，e）成像曝光光致抗蚀剂膜，以及f）用 水性碱性显影液。

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