发明申请
US20090186444A1 Transistor, method of manufacturing transistor, and method of operating transistor
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晶体管,晶体管的制造方法以及晶体管的工作方法
- 专利标题: Transistor, method of manufacturing transistor, and method of operating transistor
- 专利标题(中): 晶体管,晶体管的制造方法以及晶体管的工作方法
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申请号: US12216742申请日: 2008-07-10
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公开(公告)号: US20090186444A1公开(公告)日: 2009-07-23
- 发明人: Choong-Rae Cho , In-Kyeong Yoo , Myoung-Jae Lee
- 申请人: Choong-Rae Cho , In-Kyeong Yoo , Myoung-Jae Lee
- 优先权: KR10-2004-0093693 20051116
- 主分类号: H01L21/20
- IPC分类号: H01L21/20
摘要:
A transistor in which a physical property of its channel is changed according to an applied voltage, and methods of manufacturing and operating the same are provided. The transistor may include a first conductive layer on a substrate, a phase change layer and a second conductive layer which are sequentially stacked on the first conductive layer, a first current direction limiting unit and a second current direction limiting unit formed on the second conductive layer by being separated within a space, a third conductive layer and a fourth conductive layer formed on the first current direction limiting unit and the second current direction limiting unit, respectively, a word line connected to the third conductive layer, a bit line connected to the fourth conductive layer, and a voltage lowering unit connected to the word line.
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