发明申请
- 专利标题: Hybrid Bandgap Engineering For Super-Hetero-Epitaxial Semiconductor Materials, and Products Thereof
- 专利标题(中): 超异质外延半导体材料的混合带隙工程及其产品
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申请号: US12254134申请日: 2008-10-20
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公开(公告)号: US20090220047A1公开(公告)日: 2009-09-03
- 发明人: Yeonjoon Park , Sang H. Choi , Glen C. King , James R. Elliott
- 申请人: Yeonjoon Park , Sang H. Choi , Glen C. King , James R. Elliott
- 申请人地址: US DC Washington
- 专利权人: The United States of America as represented by the Administrator of the National Aeronautics,Space Administration
- 当前专利权人: The United States of America as represented by the Administrator of the National Aeronautics,Space Administration
- 当前专利权人地址: US DC Washington
- 主分类号: G01N23/20
- IPC分类号: G01N23/20 ; H01B1/02 ; G06F17/10
摘要:
“Super-hetero-epitaxial” combinations comprise epitaxial growth of one material on a different material with different crystal structure. Compatible crystal structures may be identified using a “Tri-Unity” system. New bandgap engineering diagrams are provided for each class of combination, based on determination of hybrid lattice constants for the constituent materials in accordance with lattice-matching equations. Using known bandgap figures for previously tested materials, new materials with lattice constants that match desired substrates and have the desired bandgap properties may be formulated by reference to the diagrams and lattice matching equations. In one embodiment, this analysis makes it possible to formulate new super-hetero-epitaxial semiconductor systems, such as systems based on group IV alloys on c-plane LaF3; group IV alloys on c-plane langasite; Group III-V alloys on c-plane langasite; and group II-VI alloys on c-plane sapphire.
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