发明申请
- 专利标题： Stripper For Copper/Low k BEOL Clean
- 专利标题（中）： 铜/低k剥离器BEOL清洁
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申请号： US12400332申请日： 2009-03-09
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公开(公告)号： US20090229629A1公开(公告)日： 2009-09-17
- 发明人: Yi-Chia Lee , Wen Dar Liu , Archie Liao , Matthew I. Egbe , Madhukar Bhaskara Rao , Michael Walter Legenza , Chimin Sheu
- 申请人： Yi-Chia Lee , Wen Dar Liu , Archie Liao , Matthew I. Egbe , Madhukar Bhaskara Rao , Michael Walter Legenza , Chimin Sheu
- 申请人地址： US PA Allentown
- 专利权人： AIR PRODUCTS AND CHEMICALS, INC.
- 当前专利权人： AIR PRODUCTS AND CHEMICALS, INC.
- 当前专利权人地址： US PA Allentown
- 主分类号： C23G1/02
- IPC分类号： C23G1/02 ; G03F7/42
摘要：
The present invention is a chemical stripper formulation for removing photoresist and the residue of etching and ashing of electronic device substrates, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride. The present invention is also a process for removing photoresist and the residue of etching and ashing of electronic device substrates by contacting the substrate with a formulation, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride.
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