发明申请
US20090239161A1 APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY
审中-公开
半导体纳米尺寸颗粒的应用于光刻机
- 专利标题： APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY
- 专利标题（中）： 半导体纳米尺寸颗粒的应用于光刻机
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申请号： US12415013申请日： 2009-03-31
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公开(公告)号： US20090239161A1公开(公告)日： 2009-09-24
- 发明人: Zhiyun Chen , Erin F. Fleet , Gregory Cooper
- 申请人： Zhiyun Chen , Erin F. Fleet , Gregory Cooper
- 申请人地址： US MD College Park
- 专利权人： PIXELLIGENT TECHNOLOGIES LLC
- 当前专利权人： PIXELLIGENT TECHNOLOGIES LLC
- 当前专利权人地址： US MD College Park
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.