ADVANCED LIGHT EXTRACTION STRUCTURE
    1.
    发明申请
    ADVANCED LIGHT EXTRACTION STRUCTURE 审中-公开
    先进的光提取结构

    公开(公告)号:US20150380688A1

    公开(公告)日:2015-12-31

    申请号:US14120419

    申请日:2013-07-08

    IPC分类号: H01L51/52 H01L27/32

    摘要: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.

    摘要翻译: 描述了半导体纳米晶体及其在溶剂和其它介质中的分散体的制备。 本文所述的纳米晶体具有小(1-10nm)的粒度,具有最小的聚集,并且可以高产率合成。 在合成后的纳米晶体上的封端剂以及经历了帽交换反应的纳米晶体导致在极性和非极性溶剂中形成稳定的悬浮液,这可能导致形成高质量的纳米复合膜。

    Method, device, and system for implementing LR-PON
    2.
    发明授权
    Method, device, and system for implementing LR-PON 有权
    实现LR-PON的方法,设备和系统

    公开(公告)号:US08666249B2

    公开(公告)日:2014-03-04

    申请号:US13098005

    申请日:2011-04-29

    IPC分类号: H04J14/00

    摘要: A method, device and system for implementing a long reach passive optical network (LR-PON) are provided, which solve the problem that the cost for establishing an LR-PON system is high. The method includes: receiving an uplink burst packet transmitted by an optical network unit (ONU) in a burst manner (101), converting a burst optical signal of the uplink burst packet into a continuous optical signal, and transmitting the continuous optical signal to a receiving device (105). The present invention is applicable to an LR-PON.

    摘要翻译: 提供了实现长距离无源光网络(LR-PON)的方法,设备和系统,解决了建立LR-PON系统的成本高的问题。 该方法包括:以突发方式(101)接收由光网络单元(ONU)发送的上行链路突发分组,将上行链路突发分组的突发光信号转换为连续光信号,并将连续光信号发送到 接收设备(105)。 本发明可应用于LR-PON。

    Applications of semiconductor nano-sized particles for photolithography
    6.
    发明授权
    Applications of semiconductor nano-sized particles for photolithography 失效
    半导体纳米粒子用于光刻的应用

    公开(公告)号:US07524616B2

    公开(公告)日:2009-04-28

    申请号:US10792377

    申请日:2004-03-04

    IPC分类号: G03F7/26 G03F7/20

    摘要: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.

    摘要翻译: 半导体纳米尺寸颗粒具有独特的光学性质,使其成为UV光刻技术中各种应用的理想选择。 在该专利中,描述了包括在浸没式光刻中使用半导体纳米尺寸颗粒或含半导体纳米尺寸颗粒的材料作为高折射介质的几种这样的应用,作为光学中的抗反射涂层,光刻中的防护薄膜和UV光致抗蚀剂中的敏化剂 。

    APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY
    9.
    发明申请
    APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY 审中-公开
    半导体纳米尺寸颗粒的应用于光刻机

    公开(公告)号:US20110281221A1

    公开(公告)日:2011-11-17

    申请号:US13189143

    申请日:2011-07-22

    IPC分类号: G03F7/26 B82Y30/00

    摘要: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.

    摘要翻译: 半导体纳米尺寸颗粒具有独特的光学性质,使其成为UV光刻技术中各种应用的理想选择。 在该专利中,描述了包括在浸没式光刻中使用半导体纳米尺寸颗粒或含半导体纳米尺寸颗粒的材料作为高折射介质的几种这样的应用,作为光学中的抗反射涂层,光刻中的防护薄膜和在UV光致抗蚀剂中的敏化剂 。