发明申请
- 专利标题： Positioning System, Lithographic Apparatus and Device Manufacturing Method
- 专利标题（中）： 定位系统，平版印刷设备和器件制造方法
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申请号： US12409919申请日： 2009-03-24
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公开(公告)号： US20090262325A1公开(公告)日： 2009-10-22
- 发明人: Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etienne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
- 申请人： Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etienne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; H05K7/02
摘要：
A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
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