发明申请
- 专利标题： IMMERSION LITHOGRAPHIC APPARATUS, DRYING DEVICE, IMMERSION METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 倾斜平面设备，干燥装置，浸入式计量装置和装置制造方法
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申请号： US12437466申请日： 2009-05-07
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公开(公告)号： US20090279063A1公开(公告)日： 2009-11-12
- 发明人: Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
- 申请人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.