发明申请
US20090291389A1 PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE
有权
用于BEOL应用的光电介质材料和使用方法
- 专利标题: PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE
- 专利标题(中): 用于BEOL应用的光电介质材料和使用方法
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申请号: US12126287申请日: 2008-05-23
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公开(公告)号: US20090291389A1公开(公告)日: 2009-11-26
- 发明人: Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
- 申请人: Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; C08G77/12 ; G03F7/20
摘要:
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.