发明申请
- 专利标题： NOVEL WAFER'S AMBIANCE CONTROL
- 专利标题（中）： 新浪潮的安全控制
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申请号： US12435861申请日： 2009-05-05
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公开(公告)号： US20090317214A1公开(公告)日： 2009-12-24
- 发明人: Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
- 申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
- 申请人地址： TW Hsin-Chu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/677 ; H01L21/67 ; B65D81/26 ; F25B29/00
摘要：
A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.
公开/授权文献
- US08827695B2 Wafer's ambiance control 公开/授权日：2014-09-09
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