发明申请
- 专利标题: Processing system
- 专利标题(中): 处理系统
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申请号: US12378634申请日: 2009-02-18
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公开(公告)号: US20100024730A1公开(公告)日: 2010-02-04
- 发明人: Emmerich Bertagnolli , Heinz Wanzenboeck , Wolfram Buehler , Camille Stebler , Ulrike Zeile , Alexander Rosenthal
- 申请人: Emmerich Bertagnolli , Heinz Wanzenboeck , Wolfram Buehler , Camille Stebler , Ulrike Zeile , Alexander Rosenthal
- 优先权: DE102008009640.7 20080218
- 主分类号: C23C16/54
- IPC分类号: C23C16/54
摘要:
A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.
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