公开(公告)号：US08957371B2

公开(公告)日：2015-02-17

申请号：US13065331

申请日：2011-03-18

申请人： Elke Haustein ,  Wolfram Bühler ,  Camille Stebler ,  Holger Dömer

发明人： Elke Haustein ,  Wolfram Bühler ,  Camille Stebler ,  Holger Dömer

IPC分类号： G01N23/225 ,  G01N1/30 ,  B82Y30/00 ,  H01J37/28 ,  H01J37/305 ,  H01J37/317 ,  G01N1/31

CPC分类号： G01N23/2251 ,  B82Y30/00 ,  G01N1/31 ,  H01J37/28 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/2067 ,  H01J2237/2809

摘要： Producing images of a specimen includes introducing a specimen into a specimen chamber of a particle-beam device, selecting a specific position on the surface of the specimen, supplying a contrast-agent precursor on the specific position, providing a particle beam and/or a light beam, guiding the particle beam and/or the light beam onto the specific position, applying a contrast-agent layer to the specific position as a result of the interaction of the particle beam and/or the light beam with the contrast-agent precursor, leaving the contrast-agent layer on the surface of the specimen for a predetermined amount of time. During the predetermined amount of time, a first part of the contrast-agent layer diffuses into the specimen and a second part of the contrast-agent layer remains on the surface of the specimen. The specimen is imaged using an optical device and/or a particle-optical device and/or using the particle beam.

摘要翻译： 生成样本的图像包括将样本引入到粒子束装置的样本室中，选择样本表面上的特定位置，在特定位置处提供造影剂前体，提供粒子束和/或 光束，将粒子束和/或光束引导到特定位置，由于粒子束和/或光束与造影剂前体的相互作用而将造影剂层施加到特定位置 将造影剂层留在试样的表面上一段预定的时间。 在预定量的时间内，造影剂层的第一部分扩散到样品中，造影剂层的第二部分保留在样品的表面上。 使用光学装置和/或粒子 - 光学装置和/或使用粒子束对样本进行成像。

公开(公告)号：US20110292385A1

公开(公告)日：2011-12-01

申请号：US13065331

申请日：2011-03-18

申请人： Elke Haustein ,  Wolfram Bûhler ,  Camille Stebler ,  Holger Dömer

发明人： Elke Haustein ,  Wolfram Bûhler ,  Camille Stebler ,  Holger Dömer

IPC分类号： G01N23/225 ,  G01J3/40 ,  B05D5/00 ,  H01J40/14

CPC分类号： G01N23/2251 ,  B82Y30/00 ,  G01N1/31 ,  H01J37/28 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/2067 ,  H01J2237/2809

摘要： Producing images of a specimen includes introducing a specimen into a specimen chamber of a particle-beam device, selecting a specific position on the surface of the specimen, supplying a contrast-agent precursor on the specific position, providing a particle beam and/or a light beam, guiding the particle beam and/or the light beam onto the specific position, applying a contrast-agent layer to the specific position as a result of the interaction of the particle beam and/or the light beam with the contrast-agent precursor, leaving the contrast-agent layer on the surface of the specimen for a predetermined amount of time. During the predetermined amount of time, a first part of the contrast-agent layer diffuses into the specimen and a second part of the contrast-agent layer remains on the surface of the specimen. The specimen is imaged using an optical device and/or a particle-optical device and/or using the particle beam.

摘要翻译： 生成样本的图像包括将样本引入到粒子束装置的样本室中，选择样本表面上的特定位置，在特定位置处提供造影剂前体，提供粒子束和/或 光束，将粒子束和/或光束引导到特定位置，由于粒子束和/或光束与造影剂前体的相互作用而将造影剂层施加到特定位置 将造影剂层留在试样的表面上一段预定的时间。 在预定量的时间内，造影剂层的第一部分扩散到样品中，造影剂层的第二部分保留在样品的表面上。 使用光学装置和/或粒子 - 光学装置和/或使用粒子束对样本进行成像。

公开(公告)号：US20130098292A1

公开(公告)日：2013-04-25

申请号：US13708936

申请日：2012-12-08

申请人： Emmerich Bertagnolli ,  Heinz Wanzenboeck ,  Wolfram Buehler ,  Camille Stebler ,  Ulrike Zeile ,  Alexander Rosenthal

发明人： Emmerich Bertagnolli ,  Heinz Wanzenboeck ,  Wolfram Buehler ,  Camille Stebler ,  Ulrike Zeile ,  Alexander Rosenthal

IPC分类号： C23C16/48

CPC分类号： H01J37/3178 ,  C23C16/486 ,  C23C16/487 ,  H01J37/16 ,  H01J37/20 ,  H01J37/261 ,  H01J37/30 ,  H01J37/3056 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2602 ,  H01J2237/303 ,  H01J2237/31744

摘要： A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

公开(公告)号：US08008639B2

公开(公告)日：2011-08-30

申请号：US12268822

申请日：2008-11-11

申请人： Wolfram Buhler ,  Alexander Rosenthal ,  Camille Stebler ,  Emmerich Bertagnolli ,  Heinz Wanzenbock

发明人： Wolfram Buhler ,  Alexander Rosenthal ,  Camille Stebler ,  Emmerich Bertagnolli ,  Heinz Wanzenbock

IPC分类号： H01J37/317 ,  G03F7/20

CPC分类号： H01J37/3056 ,  H01J2237/0041 ,  H01J2237/006 ,  H01J2237/31744

摘要： A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.

摘要翻译： 一种处理系统包括：气体供给装置，通过该气体供给装置向处理对象物供给处理气体。 激活光束激活气体，从而导致物体表面的材料与处理气体之间的化学反应，导致材料从表面烧蚀或在表面沉积材料。 气体供应装置由一堆板形成，其在至少一个气体入口和至少一个气体出口之间提供气体导管系统。

公开(公告)号：US20100024730A1

公开(公告)日：2010-02-04

申请号：US12378634

申请日：2009-02-18

申请人： Emmerich Bertagnolli ,  Heinz Wanzenboeck ,  Wolfram Buehler ,  Camille Stebler ,  Ulrike Zeile ,  Alexander Rosenthal

发明人： Emmerich Bertagnolli ,  Heinz Wanzenboeck ,  Wolfram Buehler ,  Camille Stebler ,  Ulrike Zeile ,  Alexander Rosenthal

IPC分类号： C23C16/54

CPC分类号： H01J37/3178 ,  C23C16/486 ,  C23C16/487 ,  H01J37/16 ,  H01J37/20 ,  H01J37/261 ,  H01J37/30 ,  H01J37/3056 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2602 ,  H01J2237/303 ,  H01J2237/31744

摘要： A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

摘要翻译： 提供了一种用于处理物体（3）的处理系统，其中处理系统适于聚焦第一能量束，特别是电子束（11）和第二能量束，特别是离子束（21） 在可以配置被处理物体（3）的聚焦区域（29）上。 具有用于穿过能量束的两个开口（38,39）和用于供给处理气体的连接器（37））的处理室壁（35）从处理系统的真空室（2）界定处理室（45）。 通过激活能量束中的一个能量束并通过其中一个能量束检查物体来处理物体，能够使物体相对于能量束之一的传播方向的不同取向。

公开(公告)号：US20090152460A1

公开(公告)日：2009-06-18

申请号：US12268822

申请日：2008-11-11

申请人： Wolfram Buhler ,  Alexander Rosenthal ,  Camille Stebler ,  Emmerich Bertagnolli ,  Heinz Wanzenbock

发明人： Wolfram Buhler ,  Alexander Rosenthal ,  Camille Stebler ,  Emmerich Bertagnolli ,  Heinz Wanzenbock

IPC分类号： G01N23/00

CPC分类号： H01J37/3056 ,  H01J2237/0041 ,  H01J2237/006 ,  H01J2237/31744

摘要： A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.

摘要翻译： 一种处理系统包括：气体供给装置，通过该气体供给装置向处理对象物供给处理气体。 激活光束激活气体，从而导致物体表面的材料与处理气体之间的化学反应，导致材料从表面烧蚀或在表面沉积材料。 气体供应装置由一堆板形成，其在至少一个气体入口和至少一个气体出口之间提供气体导管系统。